|
|
|
|
| 49. |
T.D.Nguyen, D.J.Kim and K.-S.Kim, "Controlled
synthesis and biomolecular probe application of gold nanoparticles",
Micron, accepted (2010). |
| 48. |
S.M.Chang, S.M.Kong, K.-S.Kim, and W.-S.Kim,
"Precipitation of Calcium Carbonate Particles by Gas-Liquid Reaction:
Morphology and Size Distribution of Particles in Couette-Taylor and
Stirred Tank Reactors", Journal of Crystal Growth, accepted (2010). |
| 47. |
A.Nasonova, H.C.Pham, D.-J.Kim, W-S.Kim, T.Charinpanitkul
and K.-S.Kim, "Application of TiO2-Coated Alumina Beads
to Dielectric Barrier Discharge-Photocastalyst Hybrid Process for
NO and SO2 Removals", J. of Nanoscience & Nanotechnology, accepted
(2010). |
| 46. |
T.Charinaitkul, K.Kanjanaprapakul, N.Leelaviwat,
N.Kurukitkoson and K.-S.Kim, "Effect of arc current on characteristics
of nanocarbons prepared by cryogenic arc discharge method", J. Ind.
Eng. Chem., accepted (2010). |
| 45. |
A.Nasonova, D.-J.Kim, and K.-S.Kim, "Analysis
on SO2 Removal and Ammonium Sulfate Particle Growth in Dielectric
Barrier Discharge -Photocatalyst Hybrid Process", Industrial &
Engineering Chemistry Research, 49, 8821-8825 (2010). |
| 44. |
D.-J.Kim, J.-Y. Kang and K.-S.Kim, "Preparation
of TiO2 Thin Films by a Rotating Plasma Chemical Vapor
Deposition Reactor", J. Industrial & Engineering Technology, available
online July 15, 2010. |
| 43. |
D.-J.Kim, H.C.Pham and K.-S.Kim, "Application
of PCVD Process to Uniform Coating of TiO2 Thin Films on
Polypropylene Beads", Surface Review and Letters, 17(3), 329-335 (2010). |
| 42. |
D.-J.Kim and K.-S,Kim, "Prediction of TiO2
Thin Film Growth on the Glass Beads in a Rotating PCVD Reactor", J.
of Nanoscience and Nanotechnology, 10(5), 3211-3215 (2010). |
| 41. |
J.-W.Park, D.-W. Kim, H.-S. Seon, K.-S.Kim
and D.W.Park, "Synthesis of Carbon-Doped TiO2 Nanoparticles
Using CO2 Decomposition by Thermal Plasma", Thin Solid Films, 518,
4113-4116 (2010). |
| 40. |
D.-J.Kim, J.-Y. Kang and K.-S.Kim, "Coating
of TiO2 Thin Films by Plasma Chemical Vapor Deposition
Process", Advanced Powder Technology, 21, 136-140 (2010). |
| 39. |
D.-J.Kim, J.-Y. Kang and K.-S.Kim, "Coating
of TiO2 Thin Films by Plasma Chemical Vapor Deposition
Process", Advanced Powder Technology, 21, 136-140 (2010). |
| 38. |
A.Nasonova, P.H.Cuong, D.-J. Kim and K.-S.Kim,
"NO and SO2 Removal in Non-Thermal Plasma Reactor Packed with Glass
Beads-TiO2 Thin Film Coated by PCVD Process", Chemical
Engineering J., 156(3), 557-561 (2010). |
| 37. |
D.-J. Kim, J.-O. Baeg, S.-J. Moon and K.-S.
Kim, "Uniform Coating of TiO2 Thin Films on Particles by
Rotating Cylindrical PCVD Reactor", J. of Nanoscience and Nanotechnology,
9(7), 4285-4292 (2009). |
| 36. |
P. Sunsap, D.-J. Kim, T. Charinpanitkul and
K.-S. Kim, "Particle Trajectories and Temperature Histories of TiO2
Nanoparticles in Diffusion Flame Reactor", J. of Nanoscience and Nanotechnology,
9(7), 4259-4266 (2009). |
| 35. |
J,M,Kim, S.M.Chang, S.K.Kim, K.-S.Kim, J.S.Kim
and W.-S.Kim, "Design of SiO2/ZrO2 Core-Shell Particles using the
Sol-Gel Process", Ceramics International, 35, 1243-1247 (2009). |
| 34. |
J.M.Kim, S.M.Chang, S.M.Kong, K.-S.Kim, J.S.Kim
and W.-S.Kim, "Control of Hydroxyl Group Content in Silica Particle
synthesized by the Sol-Precipitation Process", Ceramics International,
35, 1015-1019 (2009). |
| 33. |
A,Nasonova, D-J. Kim, K.-S. Kim, W.S.Kim and
T.Charinpanitkul, "Application of TiO2 Photocatalysts to
NO and SO2 Removal in Dielectric Barrier Discharge Process", Journal
of Korean Physical Society, 54(3), 1042-1047 (2009). |
| 32. |
J.M.Kim, S.M.Chang, S.M.Kong, J.-S.Kim, I.-H.Kim.
K.-S.Kim and W.-S.Kim, "Method for Mono-dispersed Large Spherical
Particle of Silica for LCD Spacer", Molecular Crystals Liquid Crystals
Science and Technology, 492, 245-256 (2008). |
| 31. |
P. Sunsap, D.-J. Kim, and K.-S. Kim, "Fluid Dynamics and Particle
Trajectories in Diffusion Flame Reactor to Synthesize TiO2
Nanoparticles", J. of Nanoscience and Nanotechnology, 8(10), 5030-5035
(2008).
|
| 30. |
D.-J. Kim and K.-S. Kim, "Evolution of Particle
Size Distribution in Pulsed SiH4 Plasma Process", AIChE J., 54(10),
2768-2772 (2008). |
| 29. |
T.Charinaitkul, W.Tanthapanichakoon, P. Kulvanich,
and K.-S.Kim,"Granulation and Tabletization of Phamaceutical Lactose
Granules Prepared by a Top-Sprayed Fluidized Bed Granulator",J. Ind.
Eng. Chem.,14(5), 661-666 (2008). |
| 28. |
Kim,D.J. and K.-S.Kim, "Effect of Pulse Modulation
on Particle Growth in SiH4 Plasma Process", Korean J. Chem. Eng.,
25(4), 939-946 (2008). |
| 27. |
P. Sunsap, D.-J. Kim, T. Charinpanitkul, W.-S.
Kim and K.-S. Kim, "Computational Analysis on Fluid Dynamics during
the Flame Synthesis of TiO2 Nanoparticles", Journal of
Korean Physical Society, 52(4), 1298-1303 (2008). |
| 26. |
D.-J. Kim, T. Charinpanitkul, W.-S. Kim and
K.-S. Kim, "Numerical Analysis on Particle Growth in Pulsed SiH4 Plasma
Process by Discrete-Sectional Method", Journal of Korean Physical
Society, 52(4), 1292-1297 (2008). |
| 25. |
P. Sunsap, D.-J. Kim and K.-S. Kim, "Characterization
of TiO2 particles synthesized in diffusion flame reactor",
Ind. & Eng. Chem. Research. 47(7), 2308-2313 (2008). |
| 24. |
P. Sunsap, D.-J. Kim, T. Charinpanitkul and
K.-S. Kim, "Analysis on preparation of TiO2 particles by
diffusion flame reactor for photodegradations of phenol and toluene",
Res. Chem. Intermed., 34(4), 319-329(2008). |
| 23. |
A. Nasonova, D.-J. Kim, W.-S. Kim and K.-S.
Kim, ˇ°Simultaneous removal of NO and SO2 in plasma reactor packed
with TiO2-coated glass beadsˇ±, Res. Chem. Intermed., 34(4),
309-318 (2008). |
| 22. |
Ungkoon,Y., C.Sittipunt, P.Namprakai, W.Jetipattaranat,
Kyo-Seon Kim and T.Charinpanitkul, "Analysis of Microstructure and
Properties of Autoclaved Aerated Conclete Wall Construction",J. Ind.Eng.Chem.,13(7),pp1103-1108(2007). |
| 21. |
Charinpanitkul,T., K.Ruenjaikaen, P.Sunsap,
A.Witzitamornkert and Kyo-Seon Kim, "Optical Transmission of Greenhouse
Film Prepared from Composite of Polyethylene and Microsilica", J.
Ind.Eng.Chem., 13(6), 992-996 (2007). |
| 20. |
Kim,J.M., S.M.Chang, I.H.Kim, Y.E.Kim, J.H.Hwang,
Kyo-Seon Kim and W.S.Kim, "Design of Optimal Solvent for Extraction
of Bio-active Ingredients from Mulberry Leaves",Biochemical Engineering
J.,37, 271-278 (2007). |
| 19. |
Kim,D.J., J.Y.Kang, A.Nasonova, K.S. Kim and
S.J.Choi, "Numerical Simulation on Silane Plasma Chemistry in Pulsed
Plasma Process to prepare a-Si:H Thin Films", Korean J. Chem. Eng,
24(1), 154-164 (2007). |
| 18. |
Kim,D.J., A.Nasonova,J.H.Park, J.Y.Kang and
K.S. Kim, "NOx and SOx Removal by Low Temperature Plasma-Photocatalysts
Hybrid Systems", Materials Science Forum, 544-545, 91-94 (2007). |
| 17. |
Kim, K.S. and D.J.Kim, "Analysis on Uniform
Particle Coating by the Rotating Cylindrical PCVD Reactor", J. Aerosol
Science, 37(11), 1532-1544 (2006). |
| 16. |
Kim, K.S., D.J.Kim and Q.Q.Zhao, "Numerical
Analysis on Particle Coating by the Pulsed Plasma Process", Chemical
Engineering Science, 61, 3278-3289 (2006). |
| 15. |
Kim,D.J. and K.S. Kim, "Quantitative Analysis
on the Growth of Negative Ions in Pulse Modulated SiH4 Plasmas", Ind.&Eng.Chem.Res.,
44(21), 7907-7915 (2005). |
| 14. |
Kim,D.J., K.S. Kim, and Q.-Q.Zhao, "Production
of Monodisperse Nanoparticles and Application of Discrete-Monodisperse
Model in Plasma Reactors", J. Nanoparticle Research, 5, 211-223 (2003). |
| 13. |
Kim,D.J. and K.S. Kim, "Analysis on Plasma
Chemistry and Particle Growth in Pulsed Corona Discharge Process for
NOx Removal Using Discrete-Sectional Method", IEEE Trans. Plasma Sci.,31(2),
227-235 (2003). |
| 12. |
Kim, K.S., D.J.Kim, J.H.Yoon, J.Y.Park, Y.Watanabe
and M.Shiratani, "The Changes in Particle Charge Distribution during
Rapid Growth of Particles in the Plasma Reactor", J. Colloid Interface
Sci., 257, 195-207 (2003). |
| 11. |
Kim,D.J. and K.S. Kim, "Analysis on Nanoparticle
Growth by Coagulation in Silane Plasma Reactor", AIChE J., 48(11),
2499-2509 (2002). |
| 10. |
Yoon,J.H., K.S. Kim, and J.Y.Park, "Light-Induced
Effects on Transport in Hydrogenated Amorphous Silicon-Sulfur Alloys
at Different Temperatures", J.Appl.Phys.,91(12), 9878-9882 (2002). |
| 9. |
Kim, K.S. and D.J.Kim,"Plug Flow Modeling of
Particle Formation and Growth with Plasma Chemistry in NOx Removal
by Pulsed Corona Discharge Process", Aerosol Sci. & Technol.,36,
pp178-190 (2002). |
| 8. |
Kim,D.J., Y.R.Choi and K.S. Kim, "Effects of
Process Variables on NOx Conversion by Pulsed Corona Discharge Process",
Plasma Chemistry and Plasma Processing, 21(4), 625-650 (2001). |
| 7. |
Kim,D.J. and K.S. Kim, "The Factors Affecting
the Particle Distributions inside the Silane PCVD Reactor for Semiconductor
Processing", Aerosol Sci. &Technol.,32, 293-308 (2000). |
| 6. |
Kim,K.S. and D.J. Kim, "Modeling of Rapid Particle
Growth by Coagulation in Silane Plasma Reactor", J.Appl.Phys., 87(6),
2691-2699 (2000). |
| 5. |
Matsuoka,Y., M.Shiratani, T.Fukuzawa, Y.Watanabe
and K.S. Kim, "Effects of Gas Flow on Particle Growth in Silane RF
Discharges", Jpn J. Appl. Phys., 38(7B), 4556-4560 (1999). |
| 4. |
Kim, K.S. and D.J.Kim, "Analysis on the Particle
Growth in Silane PCVD Reactor for Semiconductor Processing", J.Australian
Ceramic Soc., 34, 104-109 (1998). |
| 3. |
Kim, K.S., "Analysis of Ultrafine Particles
Generation and Deposition Using Tube Furnace Reactor", AIChE J., 43(11A),
2679-2687 (1997). |
| 2. |
Kim,D.J. and K.S. Kim, "Modeling of the Evolutions
of Negative Ions in Silane PCVD for Various Process Conditions", Jpn
J. Appl. Phys., 36(7B), 4989-4996 (1997). |
| 1. |
Kim,D.J. and K.S. Kim, "Modeling of the Evolutions
of Negative Ions in Silane PCVD for Various Process Conditions", Jpn
J. Appl. Phys., 36(7B), 4989-4996 (1997). |
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